DocumentCode

2015312

Title

Effects of Sizing, Alignment and Defects on Projection Printing with Phase-Shifting Masks

Author

Pfau, A.K. ; Oldham, W.G. ; Neureuther, A.R.

Author_Institution

Electronics Research Laboratory, University of California

fYear

1991

fDate

28-30 May 1991

Firstpage

93

Lastpage

94

Keywords

Analytical models; Bars; Chromium; Etching; Ice; Laboratories; Optical microscopy; Phased arrays; Printing; Resists;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on

Conference_Location

Oiso, Japan

Type

conf

DOI

10.1109/VLSIT.1991.706006

Filename

706006