• DocumentCode
    2015984
  • Title

    3D Lithography, Etching, and Deposition Simulation (Sample-3D)

  • Author

    Scheckler, E.W. ; Toh, K.K.H. ; Hoffstetter, D.M. ; Neureuther, A.R.

  • Author_Institution
    Electronics Research Laboratory, University of California
  • fYear
    1991
  • fDate
    28-30 May 1991
  • Firstpage
    97
  • Lastpage
    98
  • Keywords
    Circuit simulation; Computational efficiency; Computational modeling; Etching; Lithography; Optical surface waves; Resists; Semiconductor device modeling; Surface topography; Topology;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1991. Digest of Technical Papers., 1991 Symposium on
  • Conference_Location
    Oiso, Japan
  • Type

    conf

  • DOI
    10.1109/VLSIT.1991.706008
  • Filename
    706008