DocumentCode
2016390
Title
Design of an InP-based deeply etched waveguide grating for the implementation of entire C- or L-band rejection filters
Author
Davanço, Marcelo ; Blumenthal, Daniel J.
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of California, Santa Barbara, CA, USA
Volume
1
fYear
2004
fDate
7-11 Nov. 2004
Firstpage
300
Abstract
In this paper, design and study of a deeply-etched grating that provides a reflection transfer function suited for implementation of an entire C- or L-optical communications band rejection filter, is presented, for applications in InP-based integrated optics.
Keywords
III-V semiconductors; diffraction gratings; etching; indium compounds; integrated optics; optical communication equipment; optical design techniques; optical filters; optical waveguides; C-band rejection filters; InP; InP-based integrated optics; L-band rejection filters; deeply etched waveguide grating design; reflection transfer function; Band pass filters; Bandwidth; Computer displays; Gratings; Integrated optics; Optical design; Optical filters; Optical reflection; Photonic band gap; Transfer functions;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN
0-7803-8557-8
Type
conf
DOI
10.1109/LEOS.2004.1363230
Filename
1363230
Link To Document