Groove depth uniformization in [110] Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication

Author

Ohwada, K. ; Negoro, Y. ; Konaka, Y. ; Oguchi, T.

fYear

1995

fDate

29 Jan-2 Feb 1995

Firstpage

100

Keywords

Acceleration; Accelerometers; Anisotropic magnetoresistance; Capacitance; Electrodes; Etching; Fabrication; Frequency; Mechanical sensors; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1995, MEMS '95, Proceedings. IEEE

Print_ISBN

0-7803-2503-6

Type

DOI

10.1109/MEMSYS.1995.472546

Filename

472546

Link To Document