Ionic treatment of the large area substrates by Hall current accelerator

Summary form only given, as follows. Summary form only given. Sputter cleaning is the most reliable way for the pretreatment of substrates before the deposition of coatings with the aid of magnetron sputtering or vacuum arc deposition. The choice of suitable technology for the sputter cleaning is important for the quality of further deposited layers, especially for their adhesion and corrosion resistance in case of large area products. A large-aperture Hall discharge accelerator was developed for the sputter cleaning of large area glass, metal and plastics sheets. The main advantage of the Hall discharge accelerator is the possibility to use active gases. The Hall accelerator developed is able to work with argon, oxygen, nitrogen and carbon dioxide.The current-voltage characteristics are presented. The sputter cleaning of glass, aluminum alloy strips has been characterized. It is shown that the heating of the strip during sputter cleaning does not lead to remarkable decrease of the hardness.