Title :
Small signal and HF noise performance of 45 nm CMOS technology in mmW range
Author :
Poulain, L. ; Waldhoff, N. ; Gloria, D. ; Danneville, F. ; Dambrine, G.
Author_Institution :
Inst. d´´Electron., de Microelectron. et de Nanotechnol. (IEMN), Villeneuve d´´Ascq, France
Abstract :
The development of applications in millimeter wave range (mmW) during the last decade is strongly related to continuous progress of Si Technology, which kept on evolving through aggressive transistor gate length down-scaling. In this context, this paper aims to present DC, small signal and noise performance up mmW range of recently developed 45-nm bulk CMOS Technology. For this purpose, S parameters were measured up to 67 GHz, a high frequency (HF) noise model was extracted in 6-40 GHz frequency range, and its accuracy verified through a comparison with the noise figure measured in W band with a 50 Ω impedance set at the transistor. The technology offers fT, fMAX respectively of 200 and 300 GHz in line with up-to-date published results for a 45 nm CMOS Technology. At the meantime, a minimum noise figure of 4.5 dB at 94 GHz is demonstrated (verified through W band noise measurements).
Keywords :
CMOS integrated circuits; MIMIC; MMIC; integrated circuit modelling; integrated circuit noise; CMOS technology; frequency 200 GHz; frequency 300 GHz; frequency 6 GHz to 40 GHz; high frequency noise performance; millimeter wave range; noise figure; size 45 nm; small signal performance; CMOS integrated circuits; CMOS technology; Frequency measurement; Logic gates; MOSFET circuits; Noise; Noise measurement; CMOS 45nm; Millimeter wave measurement; S-parameters; noise model; small signal model;
Conference_Titel :
Radio Frequency Integrated Circuits Symposium (RFIC), 2011 IEEE
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-4244-8293-1
Electronic_ISBN :
1529-2517
DOI :
10.1109/RFIC.2011.5940646