• DocumentCode
    2019760
  • Title

    Effects of the collimator on the plasma parameters in a hyper-thermal neutral beam source

  • Author

    Joung, M. ; Lho, T. ; Yoo, Seung J. ; Kim, D.C. ; Kim, Jong Soo ; Lee, B.J. ; Cho, M.H. ; Kim, G.H.

  • Author_Institution
    Dept of Phys., Pohang Univ. of Sci. & Technol., South Korea
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    349
  • Abstract
    Summary form only given, as follows. Hyper-thermal neutral beam sources are developing for the next generation semiconductor manufacturing device. The collimator in the device contacts the plasma to extract ion beam and exchange the incident ion beam to neutral beam resulted in Auger effect on the collimator surface layer. Hence, the neutral beam energy is proportional to the voltage difference between the plasma potential and bias voltage on the collimator. However, the biased collimator affects on the plasma parameters, especially the plasma potential In this presentation, the effects of the collimator biasing on the plasma parameters have been investigated by using various diagnostics tools, Langmuir probe, capacitive probe, emissive probe and grid ion energy analyzer. Ar and He plasma were used for the research. In addition, the effects of the collimator´s physical size will be discussed on the plasma parameters.
  • Keywords
    plasma materials processing; plasma sources; plasma transport processes; Auger effect; Langmuir probe; bias voltage; capacitive probe; collimator; emissive probe; grid ion energy analyzer; hyperthermal neutral beam sources; next generation semiconductor manufacturing; plasma parameters; plasma potential; surface layer; voltage difference; Collimators; Ion beams; Particle beams; Plasma devices; Plasma diagnostics; Plasma materials processing; Plasma sources; Probes; Semiconductor device manufacture; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1228958
  • Filename
    1228958