Design and Development of Square and Circular Micromachined Patch Antennas at Ka-band

Author

Sharma, Preeti ; Koul, Shiban K. ; Chandra, Sudhir

Author_Institution

Center for Appl. Res. in Electron., Indian Inst. of Technol. Delhi, New Delhi

fYear

2006

fDate

12-14 Sept. 2006

Firstpage

130

Lastpage

134

Abstract

In this paper, we report the design, development and fabrication of high performance Ka-band square and circular micromachined patch antenna using post-CMOS compatible process technology. The main emphasis of this paper is to use RF sputtering as potential metal-dielectric film deposition-process for rapid prototyping of many antenna structures in the absence of access to a well-established MEMS foundry. The fabricated antenna resonated at 35 GHz with 4.0 % impedance bandwidth

Keywords

CMOS integrated circuits; micromachining; micromechanical devices; microstrip antennas; microwave antennas; sputtering; 35 GHz; CMOS compatible process technology; Ka-band circular micromachined patch antenna; Ka-band square micromachined patch antenna; MEMS foundry; RF sputtering; bulk micromachining; metal-dielectric film deposition-process; silicon nitride membrane; Bandwidth; Biomembranes; Conductivity; Dielectric resonator antennas; Dielectric substrates; Impedance; Microstrip antennas; Patch antennas; Radio frequency; Silicon; Bulk-Micromachining; Circular patch antenna; Micromachined patch antenna; RF sputtering; Square patch antenna; silicon nitride membrane;

fLanguage

English

Publisher

ieee

Conference_Titel

RF and Microwave Conference, 2006. RFM 2006. International

Conference_Location

Putra Jaya

Print_ISBN

0-7803-9745-2

Electronic_ISBN

0-7803-9745-2

Type

conf

DOI

10.1109/RFM.2006.331053

Filename

4133568