• DocumentCode
    2021575
  • Title

    Multi keV x-ray source from femtosecond laser produced micro plasma

  • Author

    Serbanescu, C. ; Santiago, Juanito ; Fedosejevs, Robert

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    390
  • Abstract
    Summary form only given, as follows. In the experiments reported, laser-produced plasma keV x-rays have been generated by 120fs, 800nm, 0.5mJ Ti sapphire laser pulses. The experiments have concentrated not only on the characterization but also the comparison of the keV x-ray emission generated in both air and vacuum. Scaling of x-ray conversion efficiency, dependence on pulse energy, pulse duration and angle of incidence have been investigated. Size of the resultant emission spot and brightness of the source are also under study. Enhancement of the keV x-ray production through the presence of a laser prepulse shows that the interactions in the underdense plasma may also contribute to hot electron and keV x-ray generation.
  • Keywords
    plasma X-ray sources; plasma production by laser; 0.5 mJ; 120 fs; 800 nm; femtosecond laser produced microplasma; hot electrons; laser prepulse; multi keV X-ray source; pulse duration; pulse energy; underdense plasma; x-ray conversion efficiency; x-ray emission; Acceleration; Electrons; Light scattering; Optical pulses; Particle scattering; Plasma accelerators; Plasma sources; Plasma x-ray sources; X-ray lasers; X-ray scattering;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1229035
  • Filename
    1229035