Title :
Characterization and property of Ti-Ta-O films fabricated by plasma immersion ion implantation and deposition
Author :
Chen, J.Y. ; Leng, Y.X. ; Wan, G.J. ; Yang, Ping ; Sun, Hongbin ; Wang, Jiacheng ; Huang, Nicole
Author_Institution :
Sch. of Mater. Sci. & Eng., Southwest Jiaotong Univ., Chengdu, China
Abstract :
Summary form only given, as follows. In this paper, we describe work in which we have synthesized Ti-Ta-O hybrid films using plasma immersion ion implantation and deposition (PIII-D) and investigated the characterization and property of the films.
Keywords :
plasma deposition; plasma immersion ion implantation; tantalum compounds; titanium compounds; Ti-Ta-O; films; hybrid films; plasma deposition; plasma immersion ion implantation; Atomic force microscopy; Conducting materials; Inorganic materials; Insulation; Materials science and technology; Plasma immersion ion implantation; Plasma properties; Plasma sources; Semiconductor materials; Surface topography;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229048
