Title :
Plasma implantation of inner wall of cylindrical insulating tube
Author :
Tian, X.B. ; Yan, J.C. ; Yang, S.Q. ; Fu, R.K.Y. ; Chu, Paul K.
Author_Institution :
Harbin Inst. of Technol., China
Abstract :
Summary form only given, as follows. In this work, we conduct numerical investigation on the plasma implantation of the inner walls of insulating cylindrical tubes. Our I work focuses on the effects of the thickness of the insulating wall, inner diameter, distance between the negatively biased auxiliary electrode and the tube, and other factors.
Keywords :
numerical analysis; plasma immersion ion implantation; cylindrical insulating tube; inner wall; negatively biased auxiliary electrode; numerical investigation; plasma implantation; Atomic force microscopy; Conducting materials; Inorganic materials; Insulation; Materials science and technology; Plasma immersion ion implantation; Plasma properties; Plasma sources; Semiconductor materials; Surface topography;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229049
