DocumentCode :
2023586
Title :
Nd:KGW planar waveguides on silicon substrate for integrated active optical devices
Author :
Okato, T. ; Obara, M. ; Atanasov, P.A. ; Tomov, R.I.
Author_Institution :
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama, Japan
Volume :
2
fYear :
2004
fDate :
7-11 Nov. 2004
Firstpage :
861
Abstract :
This study presents the fabrication of Nd:KGW films on CeO2/Si by use of conventional PLD. A further improvement of the Nd:KGW laser waveguide by use of newly developed nozzle-gas-assisted PLD (NGA-PLD) method is presented.
Keywords :
buffer layers; cerium compounds; neodymium; optical fabrication; optical films; optical planar waveguides; pulsed laser deposition; silicon; waveguide lasers; KGd(WO4)2:Nd; Nd:KGW planar waveguides; Si; integrated active optical devices; laser waveguide; nozzle-gas-assisted PLD; silicon substrate; Buffer layers; Optical devices; Optical planar waveguides; Optical waveguides; Planar waveguides; Pulsed laser deposition; Semiconductor films; Silicon; Substrates; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
Type :
conf
DOI :
10.1109/LEOS.2004.1363513
Filename :
1363513
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2023586
بازگشت