DocumentCode :
2023854
Title :
On-state safe operating area of GaAs MESFET defined for non linear applications
Author :
Ismail, N. ; Malbert, N. ; Labat, N. ; Touboul, A. ; Muraro, J.L. ; Brasseau, F. ; Langrez, D.
Author_Institution :
Lab. IXL, Bordeaux I Univ., Talence, France
fYear :
2005
fDate :
3-4 Oct. 2005
Firstpage :
281
Lastpage :
284
Abstract :
This paper provides a new approach to evaluate the transistor safe operating area at nominal operating conditions which has been demonstrated on MESFET technology. It consists on performing on-state and off-state accelerated DC step stresses for bias conditions which can be reached by the Vds and Vgs sweeps in overdrive conditions. Both on-state and off-state stresses shown different degradation modes which can be attributed to the different stress bias conditions. On the one hand, the on-state stress corresponds to the impact ionization regime where the drain-gate voltage is considered as an accelerating factor for the device degradation. On the other hand, the off-state stress is performed for bias conditions which correspond to the gate leakage current regime in the reverse Igs-Vgs characteristics where the drain-gate voltage and the gate current are considered as an accelerating factor for the device degradation.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; GaAs; MESFET; drain-gate voltage; ionization regime; nonlinear applications; off-state stresses; on-state stresses; Acceleration; Degradation; Electric breakdown; Gallium arsenide; Intrusion detection; MESFETs; Semiconductor optical amplifiers; Space technology; Stress; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide and Other Semiconductor Application Symposium, 2005. EGAAS 2005. European
Conference_Location :
Paris
Print_ISBN :
88-902012-0-7
Type :
conf
Filename :
1637205
Link To Document :
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