• DocumentCode
    2023911
  • Title

    Interferometric lithography at 47 nm with a table-top laser

  • Author

    Capeluto, M.G. ; Vaschenko, G. ; Marconi, M.C. ; Grisham, M. ; Menoni, C.S. ; Rocca, J.J.

  • Author_Institution
    Dept. of Phys., Buenos Aires Univ., Argentina
  • Volume
    2
  • fYear
    2004
  • fDate
    7-11 Nov. 2004
  • Firstpage
    888
  • Abstract
    We use interferometric lithography to demonstrate printing of dense lines as thin as 30 nm on polymethyl-metacrylate using the high average power output from of a λ = 46.9 nm compact high repetition rate EUV laser.
  • Keywords
    light interferometers; nanolithography; nanopatterning; polymers; ultraviolet lithography; 30 nm; 46.9 nm; EUV laser; interferometric lithography; polymethyl-metacrylate; Gratings; Interference; Interferometric lithography; Laser beams; Laser theory; Mirrors; Power engineering and energy; Resists; Surface emitting lasers; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
  • Print_ISBN
    0-7803-8557-8
  • Type

    conf

  • DOI
    10.1109/LEOS.2004.1363527
  • Filename
    1363527
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2023911