DocumentCode
2023948
Title
High power CW DUV coherent light sources for metrology applications
Author
Sakuma, Jun ; Sumiyoshi, Tetsumi ; Asakawa, Yuichi ; Sekita, Hitoshi ; Obara, Minoru
Author_Institution
Cyber Laser Inc., Yokohama, Japan
Volume
2
fYear
2004
fDate
7-11 Nov. 2004
Firstpage
890
Abstract
Continuous wave coherent light sources have been developed primarily intended for metrology tools in advanced semiconductor manufacturing. 5 W at 266 nm, 150 mW at 213 nm, and 120 mW at 198.5 nm have been respectively generated.
Keywords
measurement by laser beam; ultraviolet lithography; ultraviolet sources; 120 mW; 150 mW; 198.5 nm; 213 nm; 266 nm; 5 W; DUV coherent light sources; metrology tools; semiconductor manufacturing; Frequency; Light sources; Metrology; Mirrors; Optical ring resonators; Power generation; Power lasers; Power system harmonics; Semiconductor device manufacture; Semiconductor lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN
0-7803-8557-8
Type
conf
DOI
10.1109/LEOS.2004.1363528
Filename
1363528
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