Title :
High power CW DUV coherent light sources for metrology applications
Author :
Sakuma, Jun ; Sumiyoshi, Tetsumi ; Asakawa, Yuichi ; Sekita, Hitoshi ; Obara, Minoru
Author_Institution :
Cyber Laser Inc., Yokohama, Japan
Abstract :
Continuous wave coherent light sources have been developed primarily intended for metrology tools in advanced semiconductor manufacturing. 5 W at 266 nm, 150 mW at 213 nm, and 120 mW at 198.5 nm have been respectively generated.
Keywords :
measurement by laser beam; ultraviolet lithography; ultraviolet sources; 120 mW; 150 mW; 198.5 nm; 213 nm; 266 nm; 5 W; DUV coherent light sources; metrology tools; semiconductor manufacturing; Frequency; Light sources; Metrology; Mirrors; Optical ring resonators; Power generation; Power lasers; Power system harmonics; Semiconductor device manufacture; Semiconductor lasers;
Conference_Titel :
Lasers and Electro-Optics Society, 2004. LEOS 2004. The 17th Annual Meeting of the IEEE
Print_ISBN :
0-7803-8557-8
DOI :
10.1109/LEOS.2004.1363528
