DocumentCode :
2023956
Title :
Numerical analysis and parameter optimization of thermal stress effect for low-k layer flip-chip with copper pillar bump
Author :
Yu, Huiping ; Feng, Feng ; Qin, Fei ; Wu, Wei ; An, Tong ; Chen, Pei
Author_Institution :
College of Mechanical Engineering and Applied Electronics Technology, Beijing University of Technology, China
fYear :
2015
fDate :
11-14 Aug. 2015
Firstpage :
1219
Lastpage :
1223
Abstract :
The thermal-mechanical reliability of the flip-chip with copper pillar bump is analyzed through finite element numerical simulation and Kriging response surface models optimization method. The results show that: the successive order of factors affecting the chip warpage is: die thickness, bump pitch, die thickness, substrate thickness, Cu Pillar height, Cu Pillar height, PI thickness, PI opening size; the successive order of factors affecting the stress is: PI opening size, bump pitch, PI thickness, die thickness, Cu Pillar height, substrate thickness; the objectives and constraints are explicated through Kriging model. In Kriging model, the quadratic form is adopted as regression function, Gaussian function is chosen as correlative function, and sequential quadratic programming is used to solve the problem. After optimization, the first principal stress is decreased significantly on the Low-K layer; meanwhile, chip warpage is under control.
Keywords :
Copper; Fitting; Flip-chip devices; Optimization; Response surface methodology; Stress; Substrates; copper pillar bump; finite element numerical simulation; reliability; response surface models optimization;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronic Packaging Technology (ICEPT), 2015 16th International Conference on
Conference_Location :
Changsha, China
Type :
conf
DOI :
10.1109/ICEPT.2015.7236799
Filename :
7236799
Link To Document :
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