Title :
Characterization of mask alignment offsets using wire segment holograms and a progressive offset technique
Author :
AbuGhazaleh, S.A. ; Christie, P. ; Smith, S. ; Gundlach, A.M. ; Stevenson, J.T.M. ; Walton, A.J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Delaware Univ., Newark, DE, USA
Abstract :
This paper presents data characterizing alignment offsets in a commercial 1 μm fabrication process using a combination of wire segment holograms and a progressive offset technique. The test structure is essentially a binary computer generated hologram constructed from wire segments and is designed to project a image when the masks for the process are in prefect alignment. Characterization using the technique indicates a mask misalignment of between 0.1 and 0.3 μm, and this is confirmed using atomic force microscopy.
Keywords :
atomic force microscopy; computer-generated holography; integrated circuit testing; masks; 1 micron; IC fabrication; atomic force microscopy; binary computer generated hologram; mask alignment offset; null wire segment hologram; progressive offset technique; test structure; Calibration; Image coding; Large Hadron Collider; Laser beams; Testing; Tin; Wire;
Conference_Titel :
Microelectronic Test Structures, 2000. ICMTS 2000. Proceedings of the 2000 International Conference on
Print_ISBN :
0-7803-6275-7
DOI :
10.1109/ICMTS.2000.844395
