• DocumentCode
    2026021
  • Title

    Considerations on the de-embedding of differential devices using two-port techniques

  • Author

    Issakov, Vadim ; Wojnowski, Maciej ; Thiede, Andreas ; Weigel, Robert

  • Author_Institution
    Dept. of High-Freq. Electron., Univ. of Paderborn, Paderborn, Germany
  • fYear
    2009
  • fDate
    Sept. 29 2009-Oct. 1 2009
  • Firstpage
    695
  • Lastpage
    698
  • Abstract
    Differential signaling is very common for high frequency integrated circuit design. Accurate multi-mode de-embedding at multigigahertz frequencies, however, is a major challenge. The differential and common-mode parameters can be obtained by converting the measured four-port nodal S-parameters into the mixed-mode form. Under certain conditions it is possible to separate the modes and consider only the entries corresponding to the differential S-parameters. This allows to reduce the measured 4×4 matrix to a 2×2 matrix and consider the differential device as a two-port network. Thus, the standard de-embedding techniques, derived for two-port networks, can be applied to differential S-parameters. The purpose of this paper is to investigate the applicability of this approach for on-wafer measurements. We describe analytically the conditions, under which this method is valid. As an example a 2:1 transformer, manufactured in Infineon´s 0.13 μm CMOS process, has been characterized. On-chip de-embedding structures have been fabricated using the same process. The results obtained using Short-Open, Thru-Line and Thru-Line-Reflect de-embedding techniques are compared.
  • Keywords
    CMOS integrated circuits; S-parameters; integrated circuit design; Infineon CMOS process; Short-Open de-embedding; Thru-Line de-embedding; Thru-Line-Reflect de-embedding; common-mode parameters; differential S-parameters; differential device de-embedding; differential signaling; four-port nodal S-parameters; high frequency integrated circuit design; multimode de-embedding; on-chip de-embedding structures; on-wafer measurements; two-port networks; CMOS process; Calibration; Frequency; Integrated circuit technology; Matrix converters; Microwave devices; Microwave technology; Microwave theory and techniques; Millimeter wave measurements; Scattering parameters;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference, 2009. EuMC 2009. European
  • Conference_Location
    Rome
  • Print_ISBN
    978-1-4244-4748-0
  • Type

    conf

  • Filename
    5296482