DocumentCode :
2027036
Title :
RT-level interconnect optimization in DSM regime
Author :
Katkoori, Srinivas ; Alupoaei, Stelian
Author_Institution :
Dept. of Comput. Sci. & Eng., Univ. of South Florida, Tampa, FL, USA
fYear :
2000
fDate :
2000
Firstpage :
143
Lastpage :
148
Abstract :
We propose global-net clustering based RT-level datapath design methodology. Static timing analysis identifies critical nets and critical primary input/output paths. Net clustering (based shared macro-cells and criticality) yields clusters wherein each cluster has strongly interdependent nets. Clusters and nets within every cluster are prioritized based on number of critical nets, number of nets, and the total macro-cell area. We propose two approaches to generate layouts at RTL: constructive (cluster growth) approach and iterative improvement based (simulated annealing) approach. For datapaths implemented in 0.35 μm technology, for both approaches, we achieved an average decrease of 54% in longest wirelength and 53% in overall wirelength
Keywords :
CMOS digital integrated circuits; circuit layout CAD; circuit optimisation; high level synthesis; integrated circuit interconnections; integrated circuit layout; simulated annealing; timing; DSM regime; RT-level datapath design methodology; RT-level interconnect optimization; RTL layout generation; cluster growth approach; deep submicron regime; global-net clustering; iterative improvement; macro-cell area; simulated annealing; static timing analysis; Annealing; Capacitance; Computer science; Delay; Design methodology; Inorganic materials; System-on-a-chip; Temperature; Timing; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI, 2000. Proceedings. IEEE Computer Society Workshop on
Conference_Location :
Orlando, FL
Print_ISBN :
0-7695-0534-1
Type :
conf
DOI :
10.1109/IWV.2000.844543
Filename :
844543
Link To Document :
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