DocumentCode
2027787
Title
Characteristics of interface states in irradiated Pd/n-SiGe as derived from frequency- and temperature-dependent admittance
Author
Sellai, A. ; Mamor, M.
Author_Institution
Dept. of Phys., Sultan Qaboos Univ., Muscat, Oman
fYear
2012
fDate
25-28 March 2012
Firstpage
622
Lastpage
625
Abstract
We have used, in this contribution, the measured frequency-dependent ac admittance of irradiated Pd/n-GaN Schottky contacts at different temperatures ranging from 100K to 300K to derive the admittance associated with the displacement current in the Pd/GaN interfacial layer. The normalized conductance versus frequency plots at various temperatures, are characterized essentially by the presence of peaks, which is seen as a signature and a direct evidence for the presence of interface traps. The magnitudes and frequency positions of these peaks allowed the determination of the density and the energy distribution of interface traps as well as the thermal emission rates of carriers from traps and, hence, their capture cross-section.
Keywords
Ge-Si alloys; Schottky barriers; electric admittance; gallium compounds; interface states; palladium; Pd-GaN; Pd/n-GaN Schottky contact; SiGe; conductance; density determination; displacement current; energy distribution; frequency position; frequency-dependent AC admittance; interface state; interface trap; magnitude; temperature 100 K to 300 K; temperature-dependent admittance; thermal emission rate; Admittance; Frequency measurement; Interface states; Schottky diodes; Silicon; Silicon germanium; Temperature measurement; Admittance spectroscopy; Interface States; Schottky Contacts;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrotechnical Conference (MELECON), 2012 16th IEEE Mediterranean
Conference_Location
Yasmine Hammamet
ISSN
2158-8473
Print_ISBN
978-1-4673-0782-6
Type
conf
DOI
10.1109/MELCON.2012.6196508
Filename
6196508
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