Title :
Keynote speech 1: Leakage power in nanometric CMOS: Challenges and trends
Author_Institution :
Electron. Eng. Dept., Univ. Politec. de Catalunya in Barcelona, Barcelona, Spain
Abstract :
Summary form only given. As technology is scaled down in the nanometric dimensions of the devices, the variability of the manufacturing process on the circuit parameters becomes critical. In addition, environmental changes in power supply voltages and temperature on chip gradients add new uncertainties on future electronic circuits and systems. The VLSI design paradigms are to be profoundly revised. The classical “design margin” approach to compensate for uncertainty becomes ineffective and costly. An emerging design approach consists in the provision of “on-chip adaptivity” to compensate dynamically to variability: Process parameters, Voltage, Temperature and Aging (PVTA).
Keywords :
CMOS integrated circuits; VLSI; PVTA; VLSI design; electronic circuits; leakage power; manufacturing process; nanometric CMOS technology; on-chip adaptivity; power supply voltages; temperature on chip gradients; CMOS integrated circuits; Nanoscale devices; Power demand; System-on-a-chip; Uncertainty; Very large scale integration; Voltage control;
Conference_Titel :
Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2011 6th International Conference on
Conference_Location :
Athens
Print_ISBN :
978-1-61284-899-0
DOI :
10.1109/DTIS.2011.5941402