DocumentCode :
2029962
Title :
Keynote speech 1: Leakage power in nanometric CMOS: Challenges and trends
Author :
Figueras, Jose
Author_Institution :
Electron. Eng. Dept., Univ. Politec. de Catalunya in Barcelona, Barcelona, Spain
fYear :
2011
fDate :
6-8 April 2011
Firstpage :
1
Lastpage :
1
Abstract :
Summary form only given. As technology is scaled down in the nanometric dimensions of the devices, the variability of the manufacturing process on the circuit parameters becomes critical. In addition, environmental changes in power supply voltages and temperature on chip gradients add new uncertainties on future electronic circuits and systems. The VLSI design paradigms are to be profoundly revised. The classical “design margin” approach to compensate for uncertainty becomes ineffective and costly. An emerging design approach consists in the provision of “on-chip adaptivity” to compensate dynamically to variability: Process parameters, Voltage, Temperature and Aging (PVTA).
Keywords :
CMOS integrated circuits; VLSI; PVTA; VLSI design; electronic circuits; leakage power; manufacturing process; nanometric CMOS technology; on-chip adaptivity; power supply voltages; temperature on chip gradients; CMOS integrated circuits; Nanoscale devices; Power demand; System-on-a-chip; Uncertainty; Very large scale integration; Voltage control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2011 6th International Conference on
Conference_Location :
Athens
Print_ISBN :
978-1-61284-899-0
Type :
conf
DOI :
10.1109/DTIS.2011.5941402
Filename :
5941402
Link To Document :
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