• DocumentCode
    2029962
  • Title

    Keynote speech 1: Leakage power in nanometric CMOS: Challenges and trends

  • Author

    Figueras, Jose

  • Author_Institution
    Electron. Eng. Dept., Univ. Politec. de Catalunya in Barcelona, Barcelona, Spain
  • fYear
    2011
  • fDate
    6-8 April 2011
  • Firstpage
    1
  • Lastpage
    1
  • Abstract
    Summary form only given. As technology is scaled down in the nanometric dimensions of the devices, the variability of the manufacturing process on the circuit parameters becomes critical. In addition, environmental changes in power supply voltages and temperature on chip gradients add new uncertainties on future electronic circuits and systems. The VLSI design paradigms are to be profoundly revised. The classical “design margin” approach to compensate for uncertainty becomes ineffective and costly. An emerging design approach consists in the provision of “on-chip adaptivity” to compensate dynamically to variability: Process parameters, Voltage, Temperature and Aging (PVTA).
  • Keywords
    CMOS integrated circuits; VLSI; PVTA; VLSI design; electronic circuits; leakage power; manufacturing process; nanometric CMOS technology; on-chip adaptivity; power supply voltages; temperature on chip gradients; CMOS integrated circuits; Nanoscale devices; Power demand; System-on-a-chip; Uncertainty; Very large scale integration; Voltage control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2011 6th International Conference on
  • Conference_Location
    Athens
  • Print_ISBN
    978-1-61284-899-0
  • Type

    conf

  • DOI
    10.1109/DTIS.2011.5941402
  • Filename
    5941402