DocumentCode
2029962
Title
Keynote speech 1: Leakage power in nanometric CMOS: Challenges and trends
Author
Figueras, Jose
Author_Institution
Electron. Eng. Dept., Univ. Politec. de Catalunya in Barcelona, Barcelona, Spain
fYear
2011
fDate
6-8 April 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. As technology is scaled down in the nanometric dimensions of the devices, the variability of the manufacturing process on the circuit parameters becomes critical. In addition, environmental changes in power supply voltages and temperature on chip gradients add new uncertainties on future electronic circuits and systems. The VLSI design paradigms are to be profoundly revised. The classical “design margin” approach to compensate for uncertainty becomes ineffective and costly. An emerging design approach consists in the provision of “on-chip adaptivity” to compensate dynamically to variability: Process parameters, Voltage, Temperature and Aging (PVTA).
Keywords
CMOS integrated circuits; VLSI; PVTA; VLSI design; electronic circuits; leakage power; manufacturing process; nanometric CMOS technology; on-chip adaptivity; power supply voltages; temperature on chip gradients; CMOS integrated circuits; Nanoscale devices; Power demand; System-on-a-chip; Uncertainty; Very large scale integration; Voltage control;
fLanguage
English
Publisher
ieee
Conference_Titel
Design & Technology of Integrated Systems in Nanoscale Era (DTIS), 2011 6th International Conference on
Conference_Location
Athens
Print_ISBN
978-1-61284-899-0
Type
conf
DOI
10.1109/DTIS.2011.5941402
Filename
5941402
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