Title :
Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate
Author :
Yan, Jhih-Nan ; Lee, Yung-Chun
Author_Institution :
Dept. of Mech. Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
Abstract :
This paper describes the fabrication processes of a new type of metal-embedded photo-mask, which will be used in standard photolithography and for fabricating patterned sapphire substrates. This new metal-embedded photo-mask is prepared by metal contact printing lithography and therefore can easily achieve smaller feature size around or below 1 μm. Besides its easiness in fabricating and obtaining smaller line-width, this new metal-embedded photo-mask differs from a conventional Cr/glass photo-mask in that the metallic patterns are embedded and therefore are not in contact with photo-resist during UV exposure. This unique feature can minimize the damage to photo-mask in use and prolong its lifetime. In this work, this metal-embedded photo-mask is experimentally prepared and applied to photolithographic patterning of PR microstructures on sapphire substrates, which are important in LED industries.
Keywords :
masks; photoresists; ultraviolet radiation effects; LED industries; UV exposure; metal contact printing lithography; metal embedded photomask fabrication; patterned sapphire substrate; photoresist; submicrometer scaled photolithography; Industries; Metals; Optical device fabrication; Optical films; Optical imaging; Stimulated emission; Substrates; metal-embedded photo-mask; patterned sapphire substrates;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2012 7th IEEE International Conference on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4673-1122-9
DOI :
10.1109/NEMS.2012.6196717