Title :
Nano-scale mechanical relays fabricated by nanoimprint technology
Author :
Chang, Y.J. ; Liu, D.Y. ; Kuo, C.L.
Author_Institution :
Dept. of Mech. Eng., Nat. Yunlin Univ. of Sci. & Technol., Yunlin, Taiwan
Abstract :
In this paper, we first demonstrate nanoscale mechanical relays fabricated by a nanoimprint technology, called Contact-Transfer and Mask-Embedded Lithography (CMEL). With this technology, the nanoscale metallic source electrode can be easily fabricated in one step at a low cost. We successfully fabricated the three-terminal nanorelays with various lengths. The nanorelays are demonstrated by measuring the I-V curve of each device. The measured pull-in voltages are compared with the simulation results.
Keywords :
masks; microrelays; nanoelectromechanical devices; nanolithography; CMEL; I-V curve; contact-transfer; mask-embedded lithography; nanoimprint technology; nanoscale mechanical relay; nanoscale metallic source electrode; pull-in voltage; three-terminal nanorelay; Logic gates; Mechanical variables measurement; Nanoelectromechanical systems; Q measurement; Relays; Silicon; NEMS; nanoimprint; nanorelays;
Conference_Titel :
Nano/Micro Engineered and Molecular Systems (NEMS), 2012 7th IEEE International Conference on
Conference_Location :
Kyoto
Print_ISBN :
978-1-4673-1122-9
DOI :
10.1109/NEMS.2012.6196719
