Title :
Experimental Evaluation of Second Harmonic Generation for Non-Invasive Contamination Detection in SOI Wafers
Author :
Alles, Michael L. ; Schrimpf, Ronald D. ; Fleetwood, Daniel M. ; Pasternak, Robert ; Tolk, Norman H. ; Standley, Robert W.
Author_Institution :
Vanderbilt Univ., Nashville, TN
Abstract :
We report experimental results from non-invasive second harmonic generation (SHG) measurements applied to detect the presence of contamination at the silicon/buried oxide (BOX) and BOX/substrate interfaces in silicon-on-insulator (SOI) wafers. The potential application of SHG as a metrology tool for process control is demonstrated
Keywords :
contamination; harmonic generation; process control; silicon-on-insulator; SOI wafers; Si; buried oxide; noninvasive contamination detection; process control; second harmonic generation; silicon on insulator; Contamination; Frequency conversion; Metrology; Optical harmonic generation; Plasma measurements; Pollution measurement; Pulse measurements; Semiconductor materials; Silicon on insulator technology; Ultrafast optics;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638714
