Title :
Performance of Polarized Illuminators in Hyper NA Lithography Tools
Author :
Matsuyama, Tomoyuki ; Nishinaga, Hisashi ; Tokuda, Noriaki ; Hirukawa, Shigeru ; Tanitsu, Osamu ; Owa, Soichi
Author_Institution :
Nikon Corp.
Abstract :
Polarized light illumination is essential for hyper-NA imaging such as immersion lithography. This is confirmed by comparison of optical images between unpolarized light illumination condition and polarized light illumination condition. In this paper, we introduce our polarized light illumination apparatus and some experimental results, which confirm the effect of improvement of the imaging performance by utilization of polarized light illumination. In addition, required quality of the polarized light illumination for hyper NA lithography is discussed
Keywords :
immersion lithography; light polarisation; optical images; ultraviolet lithography; hyper-NA imaging; immersion lithography; lithography tools; optical images; polarized illuminators; polarized light illumination; Equations; Fourier transforms; Lenses; Lighting control; Lithography; Optical imaging; Optical polarization; Optical refraction; Resists; Tellurium;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638723
