DocumentCode
2032653
Title
Holistic Cycle Time Analysis and Improvement Project within a 200mm Lithography I-line Production Area
Author
Zarbock, Thomas ; Lehmann, Frank ; Fellendorf, Jens
Author_Institution
Infineon Technol. AG, Saxony
fYear
2006
fDate
22-24 May 2006
Firstpage
126
Lastpage
133
Abstract
In this paper, a holistic approach for analyzing and improving a work center´s performance focusing on cycle time improvement is described. We give an insight into the setup and execution of the project as well as achieved results and success factors. Also, lessons learned within this project are shared
Keywords
lithography; manufacturing processes; production management; 200 mm; cycle time improvement; lithography; Dispatching; Flow production systems; Industrial engineering; Job shop scheduling; Lithography; Performance analysis; Production systems; Queueing analysis; Semiconductor device manufacture; Time to market;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location
Boston, MA
ISSN
1078-8743
Print_ISBN
1-4244-0254-9
Type
conf
DOI
10.1109/ASMC.2006.1638736
Filename
1638736
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