DocumentCode :
2032918
Title :
Formation and Reduction of Embedded Contamination Defects Detected after FEOL Poly Patterning
Author :
Chienfan Yu ; Arndt, Roger ; Ronsheim, P. ; Hong Lin ; Zaitz, Mary ; Colwill, B. ; Bruley, J. ; Crispo, Gary
fYear :
2006
fDate :
May 22-24, 2006
Firstpage :
164
Lastpage :
168
Keywords :
Aerosols; Conductors; Contamination; Cryogenics; Etching; Inspection; Plasma applications; Plasma materials processing; Plasma sources; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
ISSN :
1078-8743
Print_ISBN :
1-4244-0254-9
Type :
conf
DOI :
10.1109/ASMC.2006.1638744
Filename :
1638744
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2032918
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