Title :
Improving Gate Poly CD Bias Control Using Voltage Controller Interface
Author_Institution :
National Semicond., South Portland, ME
Abstract :
In this paper, an etching tool hardware solution is presented for minimizing poly gate width variation induced by lower RF system equipment changes
Keywords :
etching; machine tools; process control; voltage regulators; CD bias control; RF system equipment; etching tool; gate poly etch; poly gate width variation; process control; voltage controller interface; Control systems; Electrostatics; Etching; Hardware; Plasma applications; Power generation; Process control; Radio frequency; Resists; Voltage control;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638745
