DocumentCode :
20330
Title :
Stiction-Induced Sealing of Surface Micromachined Channels
Author :
Morana, B. ; Poelma, R.H. ; Fiorentino, G. ; Jia Wei ; Creemer, J.F. ; Sarro, P.M.
Author_Institution :
ECTM-DIMES, Delft Univ. of Technol., Delft, Netherlands
Volume :
23
Issue :
2
fYear :
2014
fDate :
Apr-14
Firstpage :
459
Lastpage :
470
Abstract :
We established a technique to achieve low temperature hermetic sealing of surface micromachined channels by exploiting stiction. Using a wing-shaped structural layer, microchannels automatically seal during the drying step that follows the sacrificial etch. This avoids the need of plugging layers to close the apertures of the sacrificial etch. To demonstrate the technique, we designed a surface micromachined channel with a structural layer made of polycrystalline silicon carbide (poly-SiC). This layer integrates an array of anchored pillars to achieve long and wide microchannels (5.4 mm × 0.43 mm × 0.001 mm). To dimension the sealing-wing, we estimate the minimum adhesion energy between the poly-SiC and silicon. This is done by analytical modeling and experimental characterization of test structures in the shape of centrally-supported circular plates. The bending and adhesion of the sealing-wing is followed in situ by optical microscopy. The closed microchannels are annealed at 100 °C. Some structures are exposed to thermal stress at 760 °C. The results are inspected by white light interferometry, scanning electron microscopy, and helium leak testing. Microchannels result hermetically sealed showing leak rates below the detection limit (4×10-9 Pa·m3/s). The seal is effective to at least 600 kPa.
Keywords :
adhesion; annealing; bending; drying; etching; hermetic seals; inspection; light interferometry; microchannel plates; micromachining; micromechanical devices; optical microscopy; scanning electron microscopy; silicon compounds; stiction; thermal stresses; wide band gap semiconductors; SiC; anchored pillar array; annealed; bending; centrally-supported circular plate shape; drying; helium leak testing; inspection; low temperature hermetic sealing; minimum adhesion energy estimation; optical microscopy; plugging layer; polySiC; polycrystalline silicon carbide; sacrificial etch aperture; scanning electron microscopy; sealing-wing; stiction-induced sealing; surface micromachined channel; temperature 100 degC; temperature 760 degC; thermal stress; white light interferometry; wing-shaped structural layer; Adhesives; Etching; Force; Microchannel; Silicon; Substrates; Microchannel; sacrificial etch; sealing; silicon carbide; stiction; surface micromachining;
fLanguage :
English
Journal_Title :
Microelectromechanical Systems, Journal of
Publisher :
ieee
ISSN :
1057-7157
Type :
jour
DOI :
10.1109/JMEMS.2013.2280535
Filename :
6606800
Link To Document :
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