Title : 
Brightfield iADC Applications for Yield Learning and Excursion Monitoring
         
        
            Author : 
Wittenzellner, John
         
        
            Author_Institution : 
Micron Technol., Inc., Manassas, VA
         
        
        
        
        
        
            Abstract : 
Inline ADC provides classification data for all detected wafer defects at run time, without having a negative impact on tool throughput. MTV has successfully used iADC to monitor excursions as well as predict probe fails using inline inspections. The use of iADC has reduced MTV´s reliance on SEM review and allowed for more consistent disposition of process issues on the production floor. While iADC is not a standalone solution to yield improvement, it does provide another powerful tool for the defect engineer
         
        
            Keywords : 
inspection; integrated circuit yield; production testing; scanning electron microscopy; brightfield iADC; classification data; excursion monitoring; inline ADC; inline automatic defect classification; inline inspections; yield learning; Costs; Fabrication; Focusing; Inspection; Light scattering; Monitoring; Pixel; Production; Safety; Stability;
         
        
        
        
            Conference_Titel : 
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
         
        
            Conference_Location : 
Boston, MA
         
        
        
            Print_ISBN : 
1-4244-0254-9
         
        
        
            DOI : 
10.1109/ASMC.2006.1638752