Title :
A Best Known Method for Forming a Multi-Fab Cost Reduction Infrastructure and Applying Innovative Cost Reduction Techniques in Diffusion.
Author :
Hershkovitz, Harel ; Batra, Manoj
Author_Institution :
Intel Electron. Ltd., Lachish
Abstract :
In advanced semiconductor manufacturing, capital equipment depreciation drives a significant fixed cost in producing products. In order to remain competitive in the flash memory segment cost reduction aspects need to be in focus and it is imperative to put plans and actions in place in order to reduce the wafer cost in the early stages of the technology development. This paper presents a best known method (BKM) that describes a multi-factory cost infrastructure. The development and implementation of this BKM resulted in cost reduction, and specifically focused on the various cost reduction techniques applied in the diffusion clean room functional area. To date, 22% capital cost reduction has been attained for Intel Corporation in the diffusion area between Q1 ´04 to Q2 ´05, across the 200 mm network
Keywords :
cost reduction; flash memories; innovation management; integrated circuit manufacture; production facilities; technology management; Intel Corporation; capital equipment depreciation; innovative cost reduction; multifab cost reduction infrastructure; multifactory cost infrastructure; semiconductor manufacturing; technology development; Cities and towns; Consumer electronics; Cost function; Data engineering; Investments; Production facilities; Productivity; Profitability; Semiconductor device manufacture; Technology forecasting;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638791