Title :
An Empirical Study of Photomask Manufacturing Productivity
Author :
Berglund, C. Neil ; Weber, Charles M. ; Castilla, Cesar
Author_Institution :
Portland State Univ., OR
Abstract :
A survey-based, empirical study of photomask manufacturing productivity has led to a few significant conclusions. Firstly, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Secondly, high downtime of pattern generation tools is limiting productivity. Thirdly, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale
Keywords :
cost reduction; economies of scale; investment; manufacturing systems; masks; productivity; cost-reduction opportunities; economies of scale; engineering investment; pattern generation tools; photomask manufacturing productivity; productivity indicators; Costs; Economies of scale; Instruments; Investments; Manufacturing processes; Productivity; Protection; Pulp manufacturing; Semiconductor device manufacture; Technology management;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2006. ASMC 2006. The 17th Annual SEMI/IEEE
Conference_Location :
Boston, MA
Print_ISBN :
1-4244-0254-9
DOI :
10.1109/ASMC.2006.1638798
