DocumentCode
2034782
Title
Effect of oxidation on SGOI nanowire biosensor fabrication using Ge condensation
Author
Chang, Kow-Ming ; Chen, Chu-Feng ; Lai, Chiung-Hui ; Wu, Chin-Ning ; Hsieh, Cheng-Ting ; Wang, Yu-Bin ; Liu, Chung-Hsien
Author_Institution
Dept. of Elec. Eng. & Inst. of Elec., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
fYear
2012
fDate
5-8 March 2012
Firstpage
708
Lastpage
711
Abstract
Ge condensation offers an attractive way to increase Ge the fraction of Ge in SGOI. From authors´ previous investigations, increasing the fraction of Ge increases the sensitivity of the SiGe nanowire sensor. To understand how Ge condensation on an SGOI nanowire sensor helps to optimize the conditions of oxidation and improve the sensitivity of the sensor, the effect of oxidation gas and SiGe/α-Si stacked structure on the movement of Ge is examined. The results reveals that SiGe nanowire has a maximum sensitivity when it includes a 14% Ge containing Si1-xGex layer that is stacked on a 200 Å-thick α-Si layer and is treated for 3 min with O2 gas to which is added 13% N2 gas.
Keywords
Ge-Si alloys; biosensors; condensation; nanosensors; nanowires; oxidation; semiconductor materials; SGOI nanowire biosensor fabrication; SiGe; germanium condensation; nitrogen gas; oxidation gas; time 3 min; Nanoelectromechanical systems; Silicon germanium; SiGe-on-Insulator; bio-sensor; oxidation;
fLanguage
English
Publisher
ieee
Conference_Titel
Nano/Micro Engineered and Molecular Systems (NEMS), 2012 7th IEEE International Conference on
Conference_Location
Kyoto
Print_ISBN
978-1-4673-1122-9
Type
conf
DOI
10.1109/NEMS.2012.6196873
Filename
6196873
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