• DocumentCode
    2034782
  • Title

    Effect of oxidation on SGOI nanowire biosensor fabrication using Ge condensation

  • Author

    Chang, Kow-Ming ; Chen, Chu-Feng ; Lai, Chiung-Hui ; Wu, Chin-Ning ; Hsieh, Cheng-Ting ; Wang, Yu-Bin ; Liu, Chung-Hsien

  • Author_Institution
    Dept. of Elec. Eng. & Inst. of Elec., Nat. Chiao-Tung Univ., Hsinchu, Taiwan
  • fYear
    2012
  • fDate
    5-8 March 2012
  • Firstpage
    708
  • Lastpage
    711
  • Abstract
    Ge condensation offers an attractive way to increase Ge the fraction of Ge in SGOI. From authors´ previous investigations, increasing the fraction of Ge increases the sensitivity of the SiGe nanowire sensor. To understand how Ge condensation on an SGOI nanowire sensor helps to optimize the conditions of oxidation and improve the sensitivity of the sensor, the effect of oxidation gas and SiGe/α-Si stacked structure on the movement of Ge is examined. The results reveals that SiGe nanowire has a maximum sensitivity when it includes a 14% Ge containing Si1-xGex layer that is stacked on a 200 Å-thick α-Si layer and is treated for 3 min with O2 gas to which is added 13% N2 gas.
  • Keywords
    Ge-Si alloys; biosensors; condensation; nanosensors; nanowires; oxidation; semiconductor materials; SGOI nanowire biosensor fabrication; SiGe; germanium condensation; nitrogen gas; oxidation gas; time 3 min; Nanoelectromechanical systems; Silicon germanium; SiGe-on-Insulator; bio-sensor; oxidation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nano/Micro Engineered and Molecular Systems (NEMS), 2012 7th IEEE International Conference on
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-1-4673-1122-9
  • Type

    conf

  • DOI
    10.1109/NEMS.2012.6196873
  • Filename
    6196873