DocumentCode
2036384
Title
Investigation of characteristics and mechanical properties of nitrogen incorporated carbon films prepared by PIII-D
Author
Wen, Fushuan ; Huang, Nicole ; Sun, Hongbin ; Leng, Y.X. ; Yang, Ping ; Wan, G.J. ; Chen, J.Y. ; Wang, Jiacheng
Author_Institution
Inst. of Biomaterials & Surface Eng., Southwest Jiaotong Univ., Sichuan, China
fYear
2003
fDate
5-5 June 2003
Firstpage
400
Abstract
Summary form only given, as follows. In this paper, nitrogen incorporated carbon films were prepared by plasma immersion ion implantation and deposition (PIII-D) at room temperature, where carbon ions was generated by metal vapor vacuum arc (MEVVA) source and reacted with N/sub 2/ in the vacuum chamber.
Keywords
carbon; elemental semiconductors; mechanical properties; nitrogen; plasma deposition; plasma immersion ion implantation; 293 K; C:N; PIII-D; mechanical properties; plasma deposition; plasma immersion ion implantation; room temperature; Biomedical optical imaging; Bonding; Ion implantation; Mechanical factors; Niobium; Nitrogen; Optical films; Plasma applications; Plasma immersion ion implantation; Semiconductor films;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229941
Filename
1229941
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