Title :
Effects of ion implantation on three-dimensional model systems by plasma based ion implantation
Author :
Ishii, Takuro ; Young-Joon Yang ; Fujita, Kinya ; Hibino, Y.
Author_Institution :
Ion Eng. Res. Inst. Corp., Osaka, Japan
Abstract :
Summary form only given, as follows. In this study, we report that control of plasma condition is an important factor to achieve a uniform ion implantation for metal ion such as Nb.
Keywords :
niobium; plasma immersion ion implantation; plasma based ion implantation; three-dimensional model systems; uniform ion implantation; Ion implantation; Niobium alloys; Oxidation; Plasma applications; Plasma immersion ion implantation; Pulse shaping methods; Shape memory alloys; Spectroscopy; Voltage;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229942
