• DocumentCode
    2036398
  • Title

    Effects of ion implantation on three-dimensional model systems by plasma based ion implantation

  • Author

    Ishii, Takuro ; Young-Joon Yang ; Fujita, Kinya ; Hibino, Y.

  • Author_Institution
    Ion Eng. Res. Inst. Corp., Osaka, Japan
  • fYear
    2003
  • fDate
    5-5 June 2003
  • Firstpage
    400
  • Abstract
    Summary form only given, as follows. In this study, we report that control of plasma condition is an important factor to achieve a uniform ion implantation for metal ion such as Nb.
  • Keywords
    niobium; plasma immersion ion implantation; plasma based ion implantation; three-dimensional model systems; uniform ion implantation; Ion implantation; Niobium alloys; Oxidation; Plasma applications; Plasma immersion ion implantation; Pulse shaping methods; Shape memory alloys; Spectroscopy; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
  • Conference_Location
    Jeju, South Korea
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-7911-X
  • Type

    conf

  • DOI
    10.1109/PLASMA.2003.1229942
  • Filename
    1229942
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2036398