Title :
The etching properties of SBT thin films in BC/sub 3//Cl/sub 2//Ar plasma
Author :
Ji-Won Yeo ; Dong-Pyo Kim ; Chang-Il Kim
Author_Institution :
Sch. of Electr. & Electron. Eng, Chung-Ang Univ., Seoul, South Korea
Abstract :
Summary form only given, as follows. SrBi/sub 2/Ta/sub 2/O/sub 9/ (SBT) thin films have a lot of good features such as high resistance to polarization fatigue due to the charge compensating role of the (Bi/sub 2/O/sub 2/)/sup 2+/.
Keywords :
bismuth compounds; charge compensation; dielectric polarisation; ferroelectric thin films; sputter etching; strontium compounds; BC/sub 3/-Cl/sub 2/-Ar; SBT thin films; SrBi/sub 2/Ta/sub 2/O/sub 9/; charge compensating role; plasma etching properties; polarization fatigue; Argon; Dielectric thin films; Etching; Plasma applications; Plasma chemistry; Plasma density; Plasma properties; Plasma temperature; Transistors; Voltage;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229945
