DocumentCode
2036751
Title
Efficient CFD modeling of single wafer semiconductor fabrication systems for closed-loop evaluation
Author
Ebert, J.L. ; van der Linden, G.W. ; Kosut, R.L. ; Emami-Naeini, A.
Author_Institution
SC Solutions, Santa Clara, CA, USA
Volume
1
fYear
1997
fDate
10-12 Dec 1997
Firstpage
830
Abstract
General finite element models of single wafer systems that describe the dynamics of both solids and gas flow are usually unsuited for quick design iterations, because of computational complexity. In this paper a more efficient alternative is proposed. Solids can be modeled efficiently and with sufficient accuracy using a finite volume approach, and the gas flow can be modeled by finite element CFD software. The gas flow model can then be coupled to the solids model by iterating on the heat transfer coefficients at the interface
Keywords
CAD; electron device manufacture; finite element analysis; fluid dynamics; heat transfer; integrated circuit manufacture; iterative methods; rapid thermal processing; simulation; solid modelling; CFD modeling; finite element models; finite volume; gas flow model; heat transfer; iterative method; single wafer semiconductor fabrication; solids model; Computational fluid dynamics; Fabrication; Finite element methods; Fluid dynamics; Fluid flow; Gases; Heat transfer; Semiconductor device modeling; Solid modeling; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Decision and Control, 1997., Proceedings of the 36th IEEE Conference on
Conference_Location
San Diego, CA
ISSN
0191-2216
Print_ISBN
0-7803-4187-2
Type
conf
DOI
10.1109/CDC.1997.650743
Filename
650743
Link To Document