Title :
Production of a-C:F film in a C/sub 8/F/sub 18/ vapor RF plasma and its chemical and electrical properties
Author :
Ohta, Atsushi ; Sakai, Yoshiki ; Biloiu, C. ; Biloiu, I.A. ; Suda, Yoshiyuki
Author_Institution :
Graduate Sch. of Eng., Hokkaido Univ., Sapporo, Japan
Abstract :
Summary form only given, as follows. Amorphous polymer films composed of C and F (a-C F) was produced in a perfluoroctane (C/sub 8/F/sub 18/) vapor RF plasma. The spatiotemporal evolution of the optical emission from CF/sub 2/ and C/sub 2/ radicals was observed. They were the main fractions in a C/sub 8/F/sub 18/ decomposition process.
Keywords :
amorphous semiconductors; carbon; decomposition; electrical conductivity; elemental semiconductors; fluorine; photoluminescence; plasma chemistry; plasma deposition; C:F; a-C:F film production; amorphous polymer films; chemical properties; decomposition; electrical properties; optical emission; spatiotemporal evolution; vapor RF plasma; Chemical products; Optical films; Optical surface waves; Photovoltaic systems; Plasma chemistry; Plasma properties; Plasma waves; Production; Radio frequency; Solar power generation;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229956
