DocumentCode
2037007
Title
Formation of hydrophobic thin films on metal surfaces
Author
Hyun Soh ; Sei-ki Moon ; Young Chai Kim
Author_Institution
Dept. of Chem. Eng., Hanyang Univ., South Korea
fYear
2003
fDate
5-5 June 2003
Firstpage
411
Abstract
Summary form only given, as follows. One of the surface properties, water-repellency or hydrophobicity, has been attracted attention in various industrial fields. Hydrophobic surface treatment of materials and preparation of water-repellent films have been performed by using plasma deposition techniques. In this work, the plasma enhanced chemical vapor deposition (PECVD) method has been employed to coat thin fluorocarbon film on metal surface.
Keywords
metals; organic compounds; plasma CVD; surface treatment; PECVD; hydrophobic surface treatment; hydrophobic thin films formation; metal surface; metal surfaces; plasma enhanced chemical vapor deposition; surface properties; thin fluorocarbon film; water-repellency; Chemical industry; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma measurements; Plasma properties; Polymer films; Sputtering; Surface treatment; Transistors;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229964
Filename
1229964
Link To Document