Optical spectroscopy of CH/sub 4//H/sub 2/ and C/sub 2/H/sub 2//H/sub 2/ plasma generated in an RF planar coil inductively coupled plasma system used for CVD diamond deposition

Author

Tan, C.H. ; Ng, K.H. ; Nor, R.M. ; Wong, C.S.

Author_Institution

Dept. of Phys., Kuala Lumpur, Malaysia

fYear

2003

fDate

5-5 June 2003

Firstpage

412

Abstract

Summary form only given, as follows. One of the main issues concerning the use of low temperature plasmas to synthesize diamond films is the composition of the reactive species during the deposition process. Due to this, the gas mix ratio of the carbon containing species to hydrogen is a key experimental parameter that will determine the conditions suitable for diamond growth.

Keywords

diamond; elemental semiconductors; hydrogen neutral molecules; organic compounds; plasma CVD; plasma diagnostics; semiconductor growth; visible spectra; C; CVD diamond deposition; RF planar coil inductively coupled plasma; acetylene/H/sub 2/ plasma; gas mix ratio; low temperature plasmas; methane/H/sub 2/ plasma; optical spectra; reactive species; Coatings; Feeds; Nuclear and plasma sciences; Optical coupling; Optical films; Plasma measurements; Plasma temperature; Polymer films; Radio frequency; Spectroscopy;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on

Conference_Location

Jeju, South Korea

ISSN

0730-9244

Print_ISBN

0-7803-7911-X

Type

conf

DOI

10.1109/PLASMA.2003.1229965

Filename

1229965