Title :
Influence of deposition parameter on the structural and electrical properties of ZrO/sub 2/ thin films
Author :
Jeong, S.H. ; Bae, I.S. ; Lee, Seung Beop ; Boo, J.H.
Author_Institution :
Dept. of Chem., Sungkyunkwan Univ., Suwon, South Korea
Abstract :
Summary form only given, as follows. Thin films of ZrO/sub 2/ were deposited on Si(100) substrates using RF magnetron sputtering technique. To study an influence of the sputtering parameters such as RF power magnitude O/sub 2/ flux and annealing temperature, etc on the film structure and electrical properties, a systematic study using I-V and C-V was mainly carried out in this study.
Keywords :
annealing; electrical conductivity; sputter deposition; sputtered coatings; zirconium compounds; C-V study; I-V study; RF magnetron sputtering; RF power magnitude; Si; Si(100) substrates; ZrO/sub 2/; annealing temperature; deposition parameter influence; electrical properties; structural properties; thin films; Amorphous magnetic materials; Annealing; Dielectric thin films; Magnetic flux; Optical films; Radio frequency; Semiconductor films; Sputtering; Substrates; Surface morphology;
Conference_Titel :
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location :
Jeju, South Korea
Print_ISBN :
0-7803-7911-X
DOI :
10.1109/PLASMA.2003.1229972
