Measurements of RF planar coil inductively coupled plasma parameters by using compensated electric probe

Summary form only given, as follows. A compensated electric probe has been designed and constructed to measure plasma parameters such as electron temperature (T/sub e/), electron and ion density (n/sub e/, n/sub i/) and floating potential (v/sub f/) of the RP planar coil inductively coupled plasma source (ICP). The probe´s tip is made of molybdenum of 0.8 mm in diameter and 1.95 cm in length The RF choke, consisting of L and C, is connected adjacent to the probe´s tip to reduce RF current drawn to the probe by fluctuating field in the plasma RC lowpass filters are utilized in the measuring setup to reduce noised radiated from surrounding instruments. Argon (Ar) plasma is generated and maintained inside a cylindrical chamber by the induction fields from a planar-shape coil connected through a matching network to a 13.56 MHz RF generator. Measurements are made at different probe´s position, gas pressure and RF power. T/sub e/ is found to be between 2 - 9 eV at different conditions However, at H mode T/sub e/ is nearly constant at about 5 eV.