Electrical characteristics of the dual frequency capacitively coupled plasma (CCP)

Summary form only given, as follows. The electrical characteristics of the dual frequency capacitively coupled plasma (CCP) was measured. Applied RF power was deposited by ions when we use low frequency and an applied RF power was deposited by electrons when we use high frequency. This means that low frequency enhances the ion acceleration energy to the electrode and high frequency enhances the plasma density. We could control these two power dissipation mechanisms by using dual frequency (high frequency + low frequency).