DocumentCode
2037603
Title
EEDF measurements in dual frequency capacitively coupled plasma (CCP) and comparison with PIC simulation
Author
Jeon, B.I. ; Chang, H.Y.
Author_Institution
Dept. of Phys., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
fYear
2003
fDate
5-5 June 2003
Firstpage
423
Abstract
Summary form only given, as follows. Summary form only given. Electron Energy Distribution Functions (EEDFs) have been measured in a very narrow electrode gap (20 mm) dual frequency Capacitively Coupled Plasma (CCP). The problems when we measured EEDF in this very narrow gap dual frequency operation CCP were solved in this experiments. Measured EEDF was compared with Particle In Cell simulation results.
Keywords
discharges (electric); plasma simulation; electron energy distribution functions; particle in cell simulation; very narrow electrode gap dual frequency capacitively coupled plasma; Electrodes; Electrons; Frequency measurement; Nuclear and plasma sciences; Physics; Plasma density; Plasma measurements; Plasma properties; Plasma simulation; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1229987
Filename
1229987
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