DocumentCode
2039094
Title
Shadowgraphic studies of DLC film deposition process in dense plasma focus device
Author
Soh, L.Y. ; Lee, P. ; Shuyan, X. ; Lee, Sang-Rim ; Rawat, R.S.
Author_Institution
Natural Sci., Nat. Inst. of Educ., Singapore
fYear
2003
fDate
5-5 June 2003
Firstpage
457
Abstract
Summary form only given, as follows. The 3.3 kJ dense plasma focus (DPF) device is used to deposit diamond-like carbon (DLC) thin films on corning and silicon substrates by ablating the high purity graphite anode. For deposition of DLC thin films, the conventional central hollow copper anode is fitted with a solid graphite top, which is 3 cm long.
Keywords
diamond-like carbon; plasma deposition; plasma focus; 3 cm; 3.3 kJ; C; DLC film deposition process; Si; dense plasma focus; diamond-like carbon; high purity graphite anode; shadowgraphic studies; Anodes; Copper; Diamond-like carbon; Plasma density; Plasma devices; Semiconductor thin films; Silicon; Sputtering; Substrates; Thin film devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts. The 30th International Conference on
Conference_Location
Jeju, South Korea
ISSN
0730-9244
Print_ISBN
0-7803-7911-X
Type
conf
DOI
10.1109/PLASMA.2003.1230048
Filename
1230048
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