High-silica guided-wave optical devices

Author

Imoto, Katsuyuki ; Uetsuka, Hisato ; Kashimura, Seiichi

Author_Institution

Hitachi Cable Ltd., Ibaraki, Japan

fYear

1991

fDate

11-16 May 1991

Firstpage

483

Lastpage

488

Abstract

A high-silica embedded channel waveguide with low loss and high precision structure has been fabricated using low-temperature glass formation, lithography, reactive ion etching, and a flame hydrolysis glass deposition processes. Fusion splicing of the waveguide and single-mode fiber has also been achieved by CO₂ laser beam irradiation. Furthermore, this waveguide structure can be applied to many devices such as multi/demultiplexers, star couplers, and hybrid integration of optical active components

Keywords

integrated optics; multiplexing equipment; optical communication equipment; optical couplers; optical waveguides; optical workshop techniques; photolithography; silicon compounds; sputter etching; CO₂ laser beam irradiation; SiO₂ waveguide; demultiplexers; embedded channel waveguide; fibre channel waveguide splicing; flame hydrolysis glass deposition; fusion splicing; guided-wave optical devices; hybrid integration of optical active components; lithography; low loss waveguide; low-temperature glass formation; multiplexers; precision structure; reactive ion etching; star couplers; Etching; Fires; Glass; Lithography; Optical devices; Optical fiber couplers; Optical fiber devices; Optical losses; Optical waveguides; Splicing;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronic Components and Technology Conference, 1991. Proceedings., 41st

Conference_Location

Atlanta, GA

Print_ISBN

0-7803-0012-2

Type

conf

DOI

10.1109/ECTC.1991.163920

Filename

163920