Computer Simulation of the Field Evaporation in Tial with Additions of Nb and Comparison with Experimental Results using a New Algorithmic Approach

Author

Boll, Torben ; Al-Kassab, Talaat ; Yuan, Yong ; Liu, Zhi-guo

Author_Institution

Inst. fuer Materialphys., Gottingen Univ.

fYear

2006

fDate

38899

Firstpage

15

Lastpage

16

Abstract

The formation of an image in a field ion microscope and the field assisted evaporation of the surface atoms from atomic layers are simulated as an aid to tomographic atom probe analysis (TAP). Simulations are done for an gamma-TiAl-phase ordered structure with an L1₀ unit cell containing various additions of Nb while considering next neighbor binding energies between different partners. Algorithms that explore the vicinity around several species and analyze the degree of order based on TAP results are developed and tested on both experimental and simulated data

Keywords

aluminium alloys; atom probe field ion microscopy; binding energy; field evaporation; niobium alloys; titanium alloys; TiAlNb; atomic layer surface atoms; computer simulation; field evaporation; field ion microscope image formation; next neighbor binding energy; tomographic atom probe analysis; Algorithm design and analysis; Analytical models; Atomic layer deposition; Computational modeling; Computer simulation; Image analysis; Microscopy; Niobium; Probes; Tomography;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Nanoelectronics Conference, 2006 and the 2006 50th International Field Emission Symposium., IVNC/IFES 2006. Technical Digest. 19th International

Conference_Location

Guilin

Print_ISBN

1-4244-0401-0

Type

conf

DOI

10.1109/IVNC.2006.335311

Filename

4134436