Field Emission Properties of Pt Nanopillar Arrays Formed by Focused Ion Beams Induced Deposition

In this work, the nanofabrication of Pt nanopillar arrays with various geometries as field emitters was studied and their field emission properties were measured. Pt nanopillar arrays were fabricated on Si (100) substrate by FIB assisted chemical vapor deposition (CVD) method in a FEI DB235 dual-beam system, which is based on the principle of focusing an ion beam on the surface of a substrate in an organometallic precursor gas of C₉H₁₆Pt. For obtaining the nanopillar arrays with various densities and aspect ratios, some deposition parameters such as beam energy, beam current, beam dwelling time, angle between beam and substrate, pixel overlap ratio and the flow rate of organometallic gas, and so on were changed. By optimizing the process conditions, the formation of Pt nanopillar arrays with different densities from 0 to 1 times 10⁸/cm ², heights from 100 nm to 3mum, and tip radius from 80 to 150 nm were controlled