DocumentCode :
2041887
Title :
Radius of curvature in MBE grown heterostructures
Author :
Dieing, T. ; Usher, B.F.
Author_Institution :
Dept. of Electron. Eng., La Trobe Univ., Bundoora, Vic., Australia
fYear :
2000
fDate :
2000
Firstpage :
214
Lastpage :
217
Abstract :
Misfit stress in MBE grown heterostructures causes these structures to bend. Former theories on semiconductor wafer curvature have been re-examined and errors that have persisted in the literature have been corrected. We present an approach to describe the wafer curvature of strained layer systems using basic physical equations. A description of the position of the neutral plane for epitaxial heterostructures is presented. Wafer curvature has been studied using X-ray diffraction and the results are in good agreement with the theory.
Keywords :
X-ray diffraction; bending; internal stresses; molecular beam epitaxial growth; multilayers; semiconductor epitaxial layers; AlAs; GaAs; InGaAs; MBE grown heterostructures; X-ray diffraction; bending; curvature radius; epitaxial heterostructures; misfit stress; neutral plane; semiconductor wafer curvature; strained layer systems; Capacitive sensors; Epitaxial layers; Equations; Error correction; Gallium arsenide; Lattices; Molecular beam epitaxial growth; Stress; Substrates; X-ray diffraction;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN :
0-7803-6698-0
Type :
conf
DOI :
10.1109/COMMAD.2000.1022930
Filename :
1022930
Link To Document :
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