DocumentCode :
2042110
Title :
Gas sensing applications of novel semiconductor materials
Author :
Comini, E. ; Faglia, G. ; Sberveglieri, G. ; Galatsis, K. ; Wlodarski, W.
Author_Institution :
Dipt. di Chimica e Fisica per l´´Ingegneria e per i Materiali, Brescia Univ., Italy
fYear :
2000
fDate :
2000
Firstpage :
253
Lastpage :
258
Abstract :
Recent trends in research on gas sensors based on semiconducting thin films are presented. The films, all deposited by RF reactive sputtering from metallic targets, are investigated by the volt-amperometric technique for electrical and gas-sensing properties. The layers were able to sense CO and NO2. No surface poisoning effect was recorded, and resistance recovery was complete. Concentrations as low as 0.5 ppm NO2 and 15 ppm of CO were detected with a high relative change in the resistance and a fast dynamic. A detection limit lower than 100 ppb of NO2 is expected.
Keywords :
electrical resistivity; gas sensors; semiconductor thin films; sputtered coatings; voltammetry (chemical analysis); CO; NO2; RF reactive sputtering; detection limit; electrical properties; gas sensing applications; gas sensors; gas-sensing properties; metallic targets; resistance recovery; semiconducting thin films; semiconductor materials; surface poisoning effect; volt-amperometric technique; Electric resistance; Gas detectors; Radio frequency; Semiconductivity; Semiconductor films; Semiconductor materials; Semiconductor thin films; Sputtering; Surface resistance; Thin film sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2000. COMMAD 2000. Proceedings Conference on
Print_ISBN :
0-7803-6698-0
Type :
conf
DOI :
10.1109/COMMAD.2000.1022939
Filename :
1022939
Link To Document :
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